Trumpf is touting its TruMicro 5370 and TruMicro 7380, Dira 200-5 and a TruLaser Station 5005 with a TruMicro 2030 laser system Photonics West in San Francisco, Calif. at booth #817.
The company’s short and ultra-short pulsed TruMicro 5370 and 7380 lasers are designed for micro-processing. They are used in standard processing methods like cutting, drilling, ablating, annealing and structuring, and can be used with a number of materials. The lasers deliver higher output power and pulse repetition rates. The TruMicro 7380 laser is designed to be used with line beam optics for laser lift off, photo bleaching and surface annealing applications. It delivers 400 watts of short pulse 343 nanometers output with high pulse energies. TruMicro 7380 laser’s optical output is also designed for optimum line beam homogeneity.
The TruLaser Station 5005 is an entry-level system that offers ultra-fast laser micro-machining. The system specializes in small and medium-sized parts and, with its integrated exhaust system, comes with a very low and convenient footprint of less than 10 sq. ft.
Trumpf is also showcasing the Dira 200-5 (disk regenerative amplifiers) laser amplifier at Photonics West. The lasers deliver pulses of picosecond duration with up to 200 millijoule pulse energy. Its flexible design allows for customization of systems as needed to fit a user’s requirements. The Dira 200-5 is typically used to pump optical parametric amplifiers. The system features a disk laser used as a pump source, a titanium sapphire oscillator used as the seed laser, the multistate optical parametric amplifier (OPA) system and a synchronization unit. Dira 200-5 can be used in spectroscopy and industrial inspection.
